The NexION® 5000 multi-quadrupole ICP-MS – the first in its category to boast four quads – is innovatively designed to meet and exceed the demanding requirements of ultra-trace elemental applications. It takes ICP-MS performance beyond traditional triple quad to deliver exceptionally low background equivalent concentrations and outstanding detection limits, key to ensuring accurate, repeatable results. Plus, the NexION 5000 provides superior interference removal, phenomenal stability and unmatched matrix tolerance, for performance you can rely on.
In addition to boasting four quads, the NexION 5000 is also the proud recipient of three awards: Wiley Analytical Science Award, The Analytical Scientist Innovation Award, and R&D 100 Award.
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The NexION 5000 Cleanroom ICP-MS is suitable for cleanroom applications, designed specifically for those requiring the highest level of cleanliness and the lowest background equivalent concentrations (<1 ppt, even in hot plasma). It is equipped with a host of new and proprietary technologies which together surpass traditional triple-quad capabilities and redefine your expectations:
| Depth | 85.0 cm |
|---|---|
| Height | 85.0 cm |
| Model Name | NexION 5000 Cleanroom ICP-MS |
| Product Brand Name | NexION |
| Technology Type | Multi-Quad ICP-MS for Cleanroom Applications |
| Weight | 191.0 kg |
| Width | 114.0 cm |
Buffered oxide etchants (BOEs) are blends of hydrofluoric acid, ammonium fluoride, surfactants, and ultrapure water utilized in the semiconductor industry to etch thin films of silicon wafers. The reduction of potential contamination of silicon wafers during the etching process is crucial, as tra ...
Hydrofluoric acid (HF) is widely utilized in the semiconductor industry during the cleaning process of silicon wafers in order to reduce contamination by trace metals, particulates, and organic contaminants which would otherwise alter the functionality of the semiconductors. As such, the use of h ...
Nitric acid (HNO3) is widely utilized in the semiconductor industry during the cleaning process of silicon wafers to reduce contamination by trace metals, particulates, and organic contaminants which would otherwise alter the functionality of the semiconductors. As such, the use of a h ...
Sulfuric acid (H2SO4) is used in the semiconductor industry to clean, etch impurities on silicon wafers and strip photoresist during the chip production processes. The reduction of potential contamination on silicon wafers is crucial, as trace-metal, particulate, and organic ...
Since ultrapure water (UPW) is used throughout the semiconductor industry in a variety of applications, impurities need to be controlled as these will directly impact the quality and overall yield of semiconductor products. ICP-MS is often used to accurately quantify sub-ppt concentrations of imp ...
Nitric acid is widely used throughout the semiconductor and electronics industry. Various purity grades are required depending on the application and the intended use. For this reason, the semiconductor industry has required ever-lower detection of a broad range of impurities, including non-metal ...
As semiconductor manufacturing processes are being performed at increasing micro-levels, the demand for ICP-MS instrumentation capable of analyzing non-metallic elements at ultra-trace concentrations has grown. For these applications, the use of an ICP-MS system with a full-length resolving quadr ...
The late 20th century to early 21st century has been described as the Silicon Age, because of the large impact that elemental silicon (Si) has had on the world economy. Highly purified Si used in semiconductor electronics is essential in the production of transistors and integrated circuit chips ...
The most commonly used organic chemicals in integrated circuit (IC) fabrication are isopropyl alcohol (IPA), propylene glycol methyl ether acetate (PGMEA), propylene glycol methyl ether (PGME), and n-methyl pyrrolidone (NMP). These solvents can leave behind organic film residues with metallic and ...
Silicon (Si) is the most used semiconductor and is a critical element for producing circuits found in everyday electronics. As more industries utilize semiconductor devices and Si wafers in electronic products and services, there is an increasing demand for Si wafers with minimal impurities due t ...
Metallic contamination in semiconductor products adversely affects device performance and impacts the yield of the fabrication process. To meet the demand for higher yields and performance in wafer substrates, contamination must be minimized on the wafer surface as well as in the substrate itself ...
Fine and specialized chemicals are used throughout the manufacturing process of semiconductor and electronic products, requiring strict control of impurities. Among these impurities, contaminants of inorganic nature can adversely affect device performance and impact the yield of the fabrication p ...
Semiconductor device fabrication utilizes a variety of chemicals, whose metallic impurity levels must remain at ultra-trace levels to ensure end product quality. Inductively coupled plasma mass spectrometry (ICP-MS) is one of the most sensitive techniques for metallic impurities testing and has b ...
Contaminants in chemicals used during manufacturing processes have a direct impact on product yield and reliability of semiconductor devices. Within the whole process of integrated circuit manufacturing, wafers are sent for repeated cleaning using hydrogen peroxide (H2O2). S ...
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During the production of semiconductor devices, it is crucial to ensure that the silicon wafers are free of contaminants and impurities. The use of high-purity chemicals during the cleaning process is critical to the semiconductor product’s overall quality and performance. Therefore, it is essent ...
In today’s fast-paced world, semiconductors have become indispensable. Demands for faster and smaller chips with higher integration and lower energy consumption are increasing. Potential sources of metallic contamination in semiconductor manufacturing processes are ubiquitous, thus it is critical ...
Nickel-based superalloys are widely used in challenging environments because of their physical properties, which include, but are not limited to, toughness, high heat resistance, high strength-to-weight ratio, and low thermal conductivity. The required properties of state-of-the-art nickel-based ...
The production of electronic devices is a complex process that requires the use of ultra-pure chemicals during the manufacturing steps. High-purity-grade sulfuric acid (H2SO4) is generally used for cleaning components and etching all metal and organic impurities on silicon w ...
As the limits of detection (LODs) for trace metal analysis are increasingly being pushed to the next decimal, a need exists to meet these new detection requirements without compromising accuracy or precision. Inductively coupled plasma mass spectrometry (ICP-MS) is often the technique of choice f ...
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In the fast-paced analytical world, accurate and reproducible results are essential to guaranteeing quality and ensuring safety. What many industries have in common is the need for trace-element analysis with superior interference removal, extremely low detection limits, and outstanding backgroun ...
The science and art of creating and maintaining thriving agricultural ecosystems requires cultivating healthy soil, crops and livestock. The safety and efficacy of agricultural chemicals and their uptake into our food supply requires robust, reliable and effective analytical testing on agrochemic ...
Laboratories conducting trace-elemental analyses require high-performance instrumentation capable of delivering accurate and reproducible results, even at low concentrations. Find out how recent developments in multi-quadrupole ICP-MS technology address these evolving needs.
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The multi-award-winning NexION 5000 is the industry’s first and only four-quadrupole ICP-MS system, engineered to remove the most complex interferences and address the most challenging a ...
Quality control-monitoring and testing are important in ensuring the quality of palm oil. The quality control parameters are used to judge the quality of palm oil products and it can be monitored and tested to ensure that the palm oil is not deliberately or accidentally adulterated.
Perfect for your most challenging applications, the cutting-edge, multi-award-winning NexION® 5000 Multi-Quadrupole ICP-MS is the industry’s first and only four-quadrupole ICP-MS instrument – taking performance well beyond everyday triple-quad technology. And the scientific community i ...
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Atomic spectroscopy is a family of techniques for determining the elemental composition of an analyte by its electromagnetic or mass spectrum. Several analytical techniques are available:
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This document provides information to assist in preparing your laboratory for the 爱游戏平台注册登录 NexION® 5000 ICP-MS system prior to instrument delivery and installation.
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The NexION® 5000 is a multi-quadrupole-based ICP-MS instrument engineered to remove the most complex interferences, ideal for multi-element analysis applications requiring ultra-trace-level detection. Download this product note to discover all of its innovative features.
Product Certificate for the Nexion 5000
The novel design of the second-generation Triple Cone Interface with patent-pending OmniRing™ was developed specifically for the NexION® 5000 multi-quadrupole ICP-MS with both sensitivity and stability in mind. It builds on the Triple Cone Interface geometry of the ...
Unlike other ICP-MS systems on the market that utilize conventional 40-MHz or 27-MHz commercially available generators which are typically customized and modified to work with ICP-MS instruments, the NexION® 1000/2000/5000 ICP-MS systems feature a 34-MHz frequency free-running RF g ...
爱游戏平台注册登录 ’s AMS system provides a number of benefits to simplify analysis of high-matrix samples with theNexION family of ICP-MS instruments. By introducing a flow of argon into the spray chamber neck, the aerosol stream is diluted,allowing for more efficient ionization, fewer matrix effects, a ...
Interferences will always occur in ICP-MS and need to be dealt with. However, the NexION® 5000 multi-quadrupole ICP-MS with quadrupole Universal Cell is able to effectively and reproducibly remove spectral interferences leading to improved accuracy, repeatability and reproducibilit ...
The NexION® 5000 ICP-MS, with multi-quadrupole technology and Universal Cell, is able to take full advantage of element reactivity with 100% pure gases by analyzing them as cluster ions at higher masses where no interferences reside, and the background is clean. The Universal Cell, ...
TotalQuant, a software feature unique to 爱游戏平台注册登录 's NexION® ICP-MS systems, intelligently interprets the complete mass spectrum, providing semi-quantitative to quantitative results for all elements. TotalQuant and survey scan can provide supplementary and confirmatory information ab ...
